Radiation-sensitive resin composition
It is intended to provide a radiation-sensitive resin composition, which comprises a radiation-sensitive acid generator excellent in resolution performance, heat stability, and storage stability, suppresses fluctuations in line width and deterioration in pattern profile attributed to standing waves, and produces a resist pattern improved in nano edge roughness and LEF. The radiation-sensitive resin composition is characterized by (A) a radiation-sensitive acid generator comprising: a sulfonium salt compound typified by 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate, or the like; and a sulfonimide compound. It is preferred that the composition should further comprise (B) a resin typified by a 4-hydroxystyrene/4-t-butoxystyrene copolymer, a 4-hydroxystyrene/t-butyl (meth)acrylate, or the like.
1. A radiation-sensitive resin composition comprising: (A) a radiation-sensitive acid generator comprising: a compound having a structure represented by the following formula (1-a) and a structure represented by the following formula (1-b); and a sulfonimide compound,
wherein, in the formula (1-a), each R 1 , each R 2 , and each R 3 independently represent a hydrogen atom, a hydroxyl group, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, a linear, branched, or cyclic alkoxyl group having 1 to 10 carbon atoms, or a t-butoxycarbonylmethoxy group, and satisfy at least one of a condition under which two or more of the R 1 moieties are respectively a group other than a hydrogen atom, a condition under which two or more of the R 2 moieties are respectively a group other than a hydrogen atom, and a condition under which two or more of the R 3 moieties are respectively a group other than a hydrogen atom, and
wherein, in the formula (I-b), each R 4 independently represents a hydrogen atom, a fluorine atom, or a trifluoromethyl group, and one or more of the R 4 moieties are respectively a fluorine atom or a trifluoromethyl group; and
(B) a resin having a recurring unit represented by the following formula (2), and at least one of a recurring unit represented by the following formula (3) and a recurring unit represented by the following formula (4):
wherein, in the formula (2), R 5 represents a hydrogen atom or a methyl group, R 6 represents a monovalent organic group except for a t-butoxy group and —O—Z (Z is a monovalent acid-labile group other than a t-butyl group), m is any integer of 0 to 3, n is any integer of 1 to 3, and a plurality of the R 6 moieties may be the same as or different from each other,
wherein, in the formula (3), R 7 represents a hydrogen atom or a methyl group, R 8 represents a monovalent organic group except for a t-butoxy group and —O—Z (Z is a monovalent acid-labile group other than a t-butyl group), R 9 represents a t-butyl group, p is any integer of 0 to 3, q is any integer of 1 to 3, and a plurality of the R 8 moieties may be the same as or different from each other, and
wherein, in the formula (4), R 10 represents a hydrogen atom or a methyl group, and R 11 represents a t-butyl group, and wherein said composition excludes a resin that does not fall within the definition of resin B.
2. The radiation-sensitive resin composition according to claim 1 , wherein the resin as the component (B) is a resin further having a branch unit in which two or more structural units formed by the cleavage of a polymerizable unsaturated bond are bound via an acid-labile linking group.
3. The radiation-sensitive resin composition according to claim 2 , wherein the branch unit in which two structural units formed by the cleavage of a polymerizable unsaturated bond are bound via an acid-labile linking group in the resin as the component (B) is a unit represented by the following formula (5):
wherein, in the formula (5), each R 12 independently represents a hydrogen atom or a methyl group, and r is any integer of 0 to 4.
4. The radiation-sensitive resin composition according to claim 1 , characterized in that the sulfonimide compound in the component (A) is represented by the following formula (6):
wherein, in the formula (6), X represents a divalent group such as an alkylene, arylene, or alkoxylene group, and R 13 represents a monovalent group such as an alkyl, aryl, halogen-substituted alkyl, or halogen-substituted aryl group.
5. The radiation-sensitive resin composition according to claim 1 , characterized in that the compound having a structure represented by the formula (1-a) and a structure represented by the formula (1-b), in the component (A) is 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate.