Radiation-sensitive resin composition, polymer and compound

1. A radiation-sensitive resin composition comprising (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of formulas (1-1) to (1-3),

wherein R P represents a monovalent organic group, Z 1 represents a carbon atom, Z 2 represents a trivalent group that forms a cyclic hydrocarbon group together with Z 1 , Q 0 in the formula (1-1) individually represent a hydrogen atom or a monovalent group, provided that at least one of Q 0 represents a monovalent organic group that includes an electron-withdrawing group, Q 0 in the formula (1-3) represents a monovalent organic group that includes an electron-withdrawing group, provided that a case where all of Q 0 in the formula (1-1) represent a fluorine atom or a fluorine-substituted hydrocarbon group is excluded, and “*” indicates a bonding hand,

wherein the repeating unit (a1) includes at least one electron-withdrawing group as Q 0 , the at least one electron-withdrawing group being other than a fluorine atom or a fluorine-substituted hydrocarbon group, and being bonded directly to a carbon atom at an α-position with respect to an ester group.

2. The radiation-sensitive resin composition according to claim 1 , wherein the polymer (A) includes at least one repeating unit among repeating units shown by formulas (1p) to (3p) as the repeating unit (a1),

wherein R M1 represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, or a fluoroalkyl group having 1 to 5 carbon atoms, L B represents a single bond or a (b+1)-valent linking group, R P represents a monovalent organic group, Z 1 represents a carbon atom, Z 2 represents a trivalent group that forms a cyclic hydrocarbon group together with Z 1 , Q 0 in the formula (1p) individually represent a hydrogen atom or a monovalent group, provided that at least one of Q 0 represents a monovalent organic group that includes an electron-withdrawing group, Q 0 in the formula (3p) represents a monovalent organic group that includes an electron-withdrawing group, provided that a case where all of Q 0 in the formula (1p) represent a fluorine atom or a fluorine-substituted hydrocarbon group is excluded, and b is 1 when L B represents a single bond, and is an integer from 1 to 5 when L B does not represent a single bond, provided that a plurality of R P , a plurality of Z 2 , and a plurality of Q 0 may respectively be either the same or different when b is an integer from 2 to 5.

3. The radiation-sensitive resin composition according to claim 1 , wherein R P represents a monovalent hydrocarbon group that includes a fluorine atom.

4. The radiation-sensitive resin composition according to claim 1 , wherein R P represents a monovalent aromatic hydrocarbon group that may include a fluorine atom.

5. The radiation-sensitive resin composition according to claim 1 , further comprising (C) a polymer that has a fluorine atom content lower than that of the polymer (A), the polymer (C) including an acid-labile group.

6. The radiation-sensitive resin composition according to claim 1 , wherein the group shown by the formula (Q 0 -1) is —NO 2 or —CN.

7. A radiation-sensitive resin composition comprising (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of formulas (1-1) to (1-3), wherein the polymer (A) includes at least one repeating unit among repeating units shown by formulas (1p-1) to (1p-3) and (2p) as the repeating unit (a1),

wherein R P represents a monovalent organic group, Z 1 represents a carbon atom, Z 2 represents a trivalent group that forms a cyclic hydrocarbon group together with Z 1 , Q 0 in the formula (1-1) individually represent a hydrogen atom or a monovalent group, provided that at least one of Q 0 represents a monovalent organic group that includes an electron-withdrawing group, Q 0 in the formula (1-3) represents a monovalent organic group that includes an electron-withdrawing group, provided that a case where all of Q 0 in the formula (1-1) represent a fluorine atom or a fluorine-substituted hydrocarbon group is excluded, and “*” indicates a bonding hand,

wherein R M1 represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, or a fluoroalkyl group having 1 to 5 carbon atoms, L B represents a single bond or a (b+1)-valent linking group, R P represents a monovalent organic group, Q 0 represents a hydrogen atom or a monovalent group, Q 1 represents a hydrogen atom or a monovalent hydrocarbon group, and b is 1 when L B represents a single bond, and is an integer from 1 to 5 when L B does not represent a single bond, provided that a plurality of R P , a plurality of Q 0 , and a plurality of Q 1 may respectively be either the same or different when b is an integer from 2 to 5.

8. The radiation-sensitive resin composition according to claim 7 , wherein R P represents a monovalent hydrocarbon group that includes a fluorine atom.

9. The radiation-sensitive resin composition according to claim 7 , wherein R P represents a monovalent aromatic hydrocarbon group that may include a fluorine atom.

10. The radiation-sensitive resin composition according to claim 7 , further comprising (C) a polymer that has a fluorine atom content lower than that of the polymer (A), the polymer (C) including an acid-labile group.

11. The radiation-sensitive resin composition according to claim 7 , wherein Q 0 represents a hydrogen atom.