Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound
A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), R P represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.
1. A radiation-sensitive resin composition comprising:
a polymer comprising a first structural unit represented by formula (1-1) or (1-2), a content of the polymer with respect to a total solid content of the radiation-sensitive composition being no less than 25% by mass;
a radiation-sensitive acid generator; and
an organic solvent,
wherein in the formulae (1-1) and (1-2),
R P represents a monovalent organic group which is an acid-nonlabile group, wherein in the formula (1-1),
R 1 represents a hydrogen atom, or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms; and
R 2 represents a methylene group, an alkylene group having 2 to 10 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a group obtained from an alkylene group having 2 to 10 carbon atoms or a cycloalkylene group having 3 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —CO—, —COO—, —SO 2 O— or a combination thereof, and
wherein in the formula (1-2),
R 3 represents a hydrogen atom, or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms;
L represents a single bond, —COO— or —CONR N —, wherein R N represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms;
R 4 represents an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms or an acyl group having 2 to 5 carbon atoms;
R 5 represents a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a group obtained from an alkylene group having 2 to 10 carbon atoms or a cycloalkylene group having 3 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —CO—, —COO—, —SO 2 O— or a combination thereof;
“a” is an integer of 1 to 5; and
“b” is an integer of 0 to 4,
wherein a sum of “a” and “b” is no greater than 5, and in a case where R P , R 4 and R 5 are each present in a plurality of number, a plurality of R P s are each identical or different, a plurality of R 4 s are each identical or different and a plurality of R 5 s are each identical or different.
2. The radiation-sensitive resin composition according to claim 1 , wherein the acid-nonlabile group is:
(1) a group obtained by substituting a part or all of hydrogen atoms comprised in a monovalent hydrocarbon group having 1 to 20 carbon atoms with a polar group;
(2) a group obtained from a monovalent hydrocarbon group having 2 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —O—, —CO—, —COO—, —SO 2 O— or a combination thereof; or
(3) a group obtained from a monovalent hydrocarbon group having 2 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —O—, —CO—, —COO—, —SO 2 O— or a combination thereof and substituting a part or all of hydrogen atoms thereof with a polar group.
3. The radiation-sensitive resin composition according to claim 2 , wherein the acid-nonlabile group is the group (2) obtained from a monovalent hydrocarbon group having 2 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —O—, —CO—, —COO—, —SO 2 O— or a combination thereof.
4. The radiation-sensitive resin composition according to claim 2 , wherein the acid-nonlabile group is the group (1) obtained by substituting a part or all of hydrogen atoms comprised in a monovalent hydrocarbon group having 1 to 20 carbon atoms with a polar group.
5. A resist pattern-forming method comprising:
applying the radiation-sensitive resin composition according to claim 1 on a substrate to provide a resist film on the substrate;
exposing the resist film; and
developing the exposed resist film.
6. A radiation-sensitive resin composition comprising:
a polymer comprising a first structural unit represented by formula (1-1) or (1-2), a content of the polymer with respect to a total solid content of the radiation-sensitive composition being no less than 25% by mass;
an acid-labile group-containing polymer other than the polymer comprising the first structural unit;
a radiation-sensitive acid generator; and
an organic solvent,
wherein in the formulae (1-1) and (1-2),
R P represents a hydrogen atom or a monovalent organic group, wherein in the formula (1-1),
R 1 represents a hydrogen atom, or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms; and
R 2 represents a methylene group, an alkylene group having 2 to 10 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a group obtained from an alkylene group having 2 to 10 carbon atoms or a cycloalkylene group having 3 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —CO—, —COO—, —SO 2 O— or a combination thereof, and
wherein in the formula (1-2),
R 3 represents a hydrogen atom, or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms;
L represents a single bond, —COO— or —CONR N —, wherein R N represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms;
R 4 represents an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms or an acyl group having 2 to 5 carbon atoms;
R 5 represents a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a group obtained from an alkylene group having 2 to 10 carbon atoms or a cycloalkylene group having 3 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —CO—, —COO—, —SO 2 O— or a combination thereof;
“a” is an integer of 1 to 5; and
“b” is an integer of 0 to 4,
wherein a sum of “a” and “b” is no greater than 5, and in a case where R P , R 4 and R 5 are each present in a plurality of number, a plurality of R P s are each identical or different, a plurality of R 4 s are each identical or different and a plurality of R 5 s are each identical or different.
7. The radiation-sensitive resin composition according to claim 6 , wherein a content of the acid-labile group-containing polymer with respect to 100 parts by mass of the polymer comprising the first structural unit is from 20 parts by mass to 200 parts by mass.
8. The radiation-sensitive resin composition according to claim 6 , wherein R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.
9. The radiation-sensitive resin composition according to claim 8 , wherein the acid-labile group is represented by formula (p):
wherein in the formula (p),
R p1 represents a hydrogen atom or a monovalent chain hydrocarbon group having 1 to 10 carbon atoms; and
R p2 and R p3 each independently represent a monovalent chain hydrocarbon group having 1 to 10 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or taken together represent a ring structure having 3 to 20 ring atoms, together with the carbon atom to which R p2 and R p3 bond.
10. The radiation-sensitive resin composition according to claim 6 , wherein the polymer further comprises a second structural unit represented by formula (2):
wherein in the formula (2),
R 6 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group;
Y represents a single bond, a carbonyloxycycloalkanediyl group having 4 to 20 carbon atoms, a carbonyloxycycloalkanediyloxy group having 4 to 20 carbon atoms, an arenediyl group having 6 to 20 carbon atoms, or a carbonyloxyarenediyl group having 7 to 20 carbon atoms;
R 7 represents a monovalent chain hydrocarbon group having 1 to 10 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms; and
R 8 and R 9 each independently represent a monovalent chain hydrocarbon group having 1 to 10 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or taken together represent an alicyclic structure having 3 to 20 carbon atoms, together with the carbon atom to which R 8 and R 9 bond.
11. The radiation-sensitive resin composition according to claim 6 , wherein the polymer further comprises a structural unit represented by formula (3-1), a structural unit represented by formula (3-2), a structural unit represented by formula (3-3), a structural unit represented by formula (3-4), or a combination thereof:
wherein in the formulae (3-1) to (3-4),
R C s each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and
wherein in the formulae (3-1) to (3-3),
“c” s are each independently an integer of 1 to 3;
R A s each independently represent an alkyl group having 1 to 5 carbon atoms; and
“d” s are each independently an integer of 0 to 4,
wherein a sum of c and d is no greater than 5, and wherein in a case where R A is present in a plurality of number, a plurality of R A s are each identical or different, and
wherein in the formula (3-4),
L 3 and L 4 each independently represent a single bond, a methylene group, an alkylene group having 2 to 5 carbon atoms, a cycloalkylene group having 3 to 15 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a divalent group obtained by combining a methylene group, an alkylene group having 2 to 5 carbon atoms, a cycloalkylene group having 3 to 15 carbon atoms or an arylene group having 6 to 20 carbon atoms with —O—, —CO— or a combination thereof;
R D represents a hydrogen atom, a carboxy group, a monovalent chain hydrocarbon group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkoxycarbonyl group having 2 to 5 carbon atoms, or a group that comprises a hydroxy group at an end thereof and comprises at least one fluorine atom or fluorinated alkyl group on a carbon atom adjacent to the hydroxy group; and
e is an integer of 1 to 5,
wherein in a case where L 4 and R D are each present in a plurality of number, a plurality of L 4 s are each identical or different and a plurality of R D s are each identical or different.
12. A resist pattern-forming method comprising:
applying the radiation-sensitive resin composition according to claim 6 on a substrate to provide a resist film on the substrate;
exposing the resist film; and
developing the exposed resist film.
13. A radiation-sensitive resin composition comprising:
a polymer comprising a first structural unit represented by formula (1-1) or (1-2), a content of the polymer with respect to a total solid content of the radiation-sensitive composition being no less than 25% by mass;
a fluorine atom-containing polymer other than the polymer comprising the first structural unit;
a radiation-sensitive acid generator; and
an organic solvent,
wherein in the formulae (1-1) and (1-2),
R P represents a hydrogen atom or a monovalent organic group, wherein in the formula (1-1),
R 1 represents a hydrogen atom, or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms; and
R 2 represents a methylene group, an alkylene group having 2 to 10 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a group obtained from an alkylene group having 2 to 10 carbon atoms or a cycloalkylene group having 3 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —CO—, —COO—, —SO 2 O— or a combination thereof, and
wherein in the formula (1-2),
R 3 represents a hydrogen atom, or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms;
L represents a single bond, —COO— or —CONR N —, wherein R N represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms;
R 4 represents an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms or an acyl group having 2 to 5 carbon atoms;
R 5 represents a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a group obtained from an alkylene group having 2 to 10 carbon atoms or a cycloalkylene group having 3 to 20 carbon atoms by incorporating between adjacent two carbon atoms thereof, —CO—, —COO—, —SO 2 O— or a combination thereof;
“a” is an integer of 1 to 5; and
“b” is an integer of 0 to 4,
wherein a sum of “a” and “b” is no greater than 5, and in a case where R P , R 4 and R 5 are each present in a plurality of number, a plurality of R P s are each identical or different, a plurality of R 4 s are each identical or different and a plurality of R 5 s are each identical or different.
14. The radiation-sensitive resin composition according to claim 13 , wherein a content of the fluorine atom-containing polymer in the radiation-sensitive resin composition with respect to 100 parts by mass of the polymer comprising the first structural unit is from 0.5 parts by mass to 15 parts by mass.
15. The radiation-sensitive resin composition according to claim 13 , wherein R P in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.
16. The radiation-sensitive resin composition according to claim 15 , wherein the acid-labile group is represented by formula (p):
wherein in the formula (p),
R p1 represents a hydrogen atom or a monovalent chain hydrocarbon group having 1 to 10 carbon atoms; and
R p2 and R p3 each independently represent a monovalent chain hydrocarbon group having 1 to 10 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or taken together represent a ring structure having 3 to 20 ring atoms, together with the carbon atom to which R p2 and R p3 bond.
17. The radiation-sensitive resin composition according to claim 13 , wherein the polymer further comprises a second structural unit represented by formula (2):
wherein in the formula (2),
R 6 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group;
Y represents a single bond, a carbonyloxycycloalkanediyl group having 4 to 20 carbon atoms, a carbonyloxycycloalkanediyloxy group having 4 to 20 carbon atoms, an arenediyl group having 6 to 20 carbon atoms, or a carbonyloxyarenediyl group having 7 to 20 carbon atoms;
R 7 represents a monovalent chain hydrocarbon group having 1 to 10 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms; and
R 8 and R 9 each independently represent a monovalent chain hydrocarbon group having 1 to 10 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or taken together represent an alicyclic structure having 3 to 20 carbon atoms, together with the carbon atom to which R 8 and R 9 bond.
18. The radiation-sensitive resin composition according to claim 13 , wherein the polymer further comprises a structural unit represented by formula (3-1), a structural unit represented by formula (3-2), a structural unit represented by formula (3-3), a structural unit represented by formula (3-4), or a combination thereof:
wherein in the formulae (3-1) to (3-4),
R C s each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and
wherein in the formulae (3-1) to (3-3),
“c” s are each independently an integer of 1 to 3;
R A s each independently represent an alkyl group having 1 to 5 carbon atoms; and
“d” s are each independently an integer of 0 to 4,
wherein a sum of c and d is no greater than 5, and wherein in a case where R A is present in a plurality of number, a plurality of R A s are each identical or different, and
wherein in the formula (3-4),
L 3 and L 4 each independently represent a single bond, a methylene group, an alkylene group having 2 to 5 carbon atoms, a cycloalkylene group having 3 to 15 carbon atoms, an arylene group having 6 to 20 carbon atoms, or a divalent group obtained by combining a methylene group, an alkylene group having 2 to 5 carbon atoms, a cycloalkylene group having 3 to 15 carbon atoms or an arylene group having 6 to 20 carbon atoms with —O—, —CO— or a combination thereof;
R D represents a hydrogen atom, a carboxy group, a monovalent chain hydrocarbon group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkoxycarbonyl group having 2 to 5 carbon atoms, or a group that comprises a hydroxy group at an end thereof and comprises at least one fluorine atom or fluorinated alkyl group on a carbon atom adjacent to the hydroxy group; and
e is an integer of 1 to 5,
wherein in a case where L 4 and R D are each present in a plurality of number, a plurality of L 4 s are each identical or different and a plurality of R D s are each identical or different.
19. A resist pattern-forming method comprising:
applying the radiation-sensitive resin composition according to claim 13 on a substrate to provide a resist film on the substrate;
exposing the resist film; and
developing the exposed resist film.