Radiation-sensitive resin composition and radiation-sensitive acid generating agent
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH 2 —. R 1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO 2 —, —SO 2 —O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M + represents a monovalent cation.
1. A radiation-sensitive resin composition comprising:
a compound represented by a formula (1); and
a base polymer:
wherein, in the formula (1), A represents —CO —or —CH 2 —; R 1 represents a group represented by a formula (a1); and M + represents a monovalent cation,
wherein, in the formula (a1), R 2 represents a heterocyclic group having 3 to 30 ring atoms or a cyclic ketone group having 3 to 30 ring atoms; R 3 and R 5 each independently represent —CO—, —COO—, —OCO—,—NHCO—,—CONH or a combination thereof; R 4 represents a hydrocarbon group having 1 to 30 carbon atoms; m is an integer of 1 or 2; n is 1, wherein a part or all of hydrogen atoms included in the heterocyclic group and the cyclic ketone group represented by R 2 , and the hydrocarbon group represented by R 4 may be unsubstituted or substituted, and wherein in a case where m is 2, a plurality of R 3 s are each identical or different and a plurality of R 4 s are each identical or different; and * denotes a binding site to —O—in the formula (1).
2. The radiation-sensitive resin composition according to claim 1 , wherein M + in the formula (1) represents a sulfonium cation or an iodonium cation.
3. The radiation-sensitive resin composition according to claim 1 , wherein the base polymer comprises a structural unit represented by a formula (2):
wherein, in the formula (2), R 6 represents a hydrogen atom or a methyl group; R 7 represents a linear or branched alkyl group having 1 to 4 carbon atoms, or an alicyclic hydrocarbon group having 4 to 20 carbon atoms; and R 8 and R 9 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms, or an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or R 8 and R 9 taken together represent an alicyclic hydrocarbon group having 4 to 20 carbon atoms together with the carbon atom to which R 8 and R 9 bond.
4. The radiation-sensitive resin composition according to claim 1 , wherein the heterocyclic group represented by R 2 includes a lactone structure, a cyclic carbonate structure, a cyclic sulfide structure, or a structure represented by a formula (d-1),
5. The radiation-sensitive resin composition according to claim 1 , wherein, in the formula (a1), m is 1.
6. A radiation-sensitive acid generating agent comprising a compound represented by a formula (1):
wherein, in the formula (1), A represents —CO —or —CH 2 —; R 1 is a group represented by a formula (a1); and M + represents a monovalent cation,
wherein, in the formula (a1), R 2 represents a heterocyclic group having 3 to 30 ring atoms or a cyclic ketone group having 3 to 30 ring atoms; R 3 and R 5 each independently represent —CO—, —COO—,—OCO—, —NHCO—,—CONH or a combination thereof; R 4 represents a hydrocarbon group having 1 to 30 carbon atoms; m is an integer of 1 or 2; n is 1, wherein a part or all of hydrogen atoms included in the heterocyclic group and the cyclic ketone group represented by R 2 , and the hydrocarbon group represented by R 4 may be unsubstituted or substituted, and wherein in a case where m is 2, a plurality of R 3 s are each identical or different and a plurality of R 4 s are each identical or different; and * denotes a binding site to —O— in the formula (1).
7. The radiation-sensitive acid generating agent according to claim 6 , wherein the heterocyclic group represented by R 2 includes a lactone structure, a cyclic carbonate structure, a cyclic sulfide structure, or a structure represented by a formula (d-1),
8. The radiation-sensitive acid generating agent according to claim 6 , wherein, in the formula (a1), m is 1.