IP Library Granted Patent US 8,247,481
Granted Patent B2
US 8,247,481 · App. 13/072,788 · Granted Aug 21, 2012

Photosensitive insulating resin composition, cured product thereof and ABA block copolymer

Assignee: JSR Corporation
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Quick Facts
Patent No.
US 8,247,481
App. No.
13/072,788
Granted
Aug 21, 2012
Kind
B2
Abstract

A photosensitive insulating resin composition includes a block copolymer, a crosslinking agent, a photosensitive compound, and a solvent. The block copolymer includes a first structural unit shown by a following formula (1) and a second structural unit shown by a following formula (2), wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 represents an alkyl group having 1 to 4 carbon atoms.

Claims (50)

1. A photosensitive insulating resin composition comprising:

a block copolymer comprising:

a first structural unit shown by a following formula (1); and

a second structural unit shown by a following formula (2);

a crosslinking agent;

a photosensitive compound; and

a solvent,

wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 represents an alkyl group having 1 to 4 carbon atoms, and wherein the block copolymer is an ABA block copolymer comprising a first block including a first structural unit shown by formula (1), and a second block including a second structural unit shown by formula (2), the first block bonded to each end of the second block.

2. The photosensitive insulating resin composition according to claim 1 ,

wherein the block copolymer has a polystyrene-reduced weight average molecular weight determined by gel permeation column chromatography of about 10,000 to about 50,000.

3. The photosensitive insulating resin composition according to claim 1 ,

wherein a content of the first structural unit in the photosensitive insulating resin composition is about 40 to about 60 mol % based on a total amount (=100 mol %) of the first structural unit and the second structural unit.

4. The photosensitive insulating resin composition according to claim 1 , further comprising:

an adhesion improver.

5. The photosensitive insulating resin composition according to claim 1 , further comprising:

crosslinked particles.

6. The photosensitive insulating resin composition according to claim 1 ,

wherein the crosslinking agent comprises at least one of a first compound including two or more alkyl-etherified amino groups in molecule of the first compound, an oxirane ring-containing compound, and an oxetanyl ring-containing compound,

wherein the photosensitive compound comprises a photoacid generator, and

wherein the photosensitive insulating resin composition comprises a negative-tone photosensitive insulating resin composition.

7. The photosensitive insulating resin composition according to claim 6 ,

wherein the photoacid generator comprises a hydroxyl group-containing onium salt.

8. The photosensitive insulating resin composition according to claim 1 ,

wherein the photosensitive compound comprises a quinonediazide group-containing compound, and

wherein the photosensitive insulating resin composition comprises a positive-tone photosensitive insulating resin composition.

9. The photosensitive insulating resin composition according to claim 8 ,

wherein the crosslinking agent comprises at least one of a second compound including two or more alkyl-etherified amino groups in molecule of the second compound, and an oxirane ring-containing compound.

10. A cured product obtained by curing the photosensitive insulating resin composition according to claim 1 .

11. An ABA block copolymer comprising:

a first block including a first structural unit shown by a following formula (1); and

a second block including a second structural unit shown by a following formula (2), the first block being bonded to each end of the second block,

wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 2 represents an alkyl group having 1 to 4 carbon atoms.

12. The photosensitive insulating resin composition according to claim 2 ,

wherein a content of the first structural unit in the photosensitive insulating resin composition is about 40 to about 60 mol % based on a total amount (=100 mol %) of the first structural unit and the second structural unit.

13. The photosensitive insulating resin composition according to claim 2 , further comprising:

an adhesion improver.

14. The photosensitive insulating resin composition according to claim 3 , further comprising:

an adhesion improver.

15. The photosensitive insulating resin composition according to claim 12 , further comprising:

an adhesion improver.

16. The photosensitive insulating resin composition according to claim 2 , further comprising:

crosslinked particles.

17. The photosensitive insulating resin composition according to claim 3 , further comprising:

crosslinked particles.

18. The photosensitive insulating resin composition according to claim 4 , further comprising:

crosslinked particles.

19. The photosensitive insulating resin composition according to claim 12 , further comprising:

crosslinked particles.

20. The photosensitive insulating resin composition according to claim 13 , further comprising:

crosslinked particles.

Assignments (3)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 28, 2011
From: ITO, ATSUSHI; ASANO, SHIGEHITO; GOTO, HIROFUMI; TANABE, TAKAYOSHI
To: JSR CORPORATION
Reel/Frame 026027/0964 →
Priority Claims (2)
JP 2008-276090 · Oct 27, 2008 · national
JP 2008-297266 · Nov 20, 2008 · national
Continuity (2)
Continuation PCTJP2009067663 · Oct 9, 2009
Related Publication 20110172349A1 · Jul 14, 2011