Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film

1. A positive-type radiation-sensitive composition comprising

(A) a siloxane polymer, and

(B) a quinone diazide compound, wherein

the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole.

2. The positive-type radiation-sensitive composition according to claim 1 , wherein the siloxane polymer (A) is a hydrolysis-condensation product of a hydrolyzable silane compound comprising at least a compound represented by the following formula (1):

wherein, R 1 each independently represents any one of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an aryl group having 6 to 15 carbon atoms; R 2 each independently represents any one of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an acyl group having 1 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, where a part or all of hydrogen atoms of the alkyl group, alkenyl group, and alkyl group in R 1 and R 2 may be substituted; and n represents an integer of 0 to 3.

3. The positive-type radiation-sensitive composition according to claim 2 , wherein the siloxane polymer (A) is a hydrolysis-condensation product of (i) a compound represented by the formula (1) wherein: R 1 is an aryl group having 6 to 15 carbon atoms; R 2 is any of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, and an acyl group having 1 to 6 carbon atoms; and n represents an integer of 1 to 3, and (ii) a compound represented by the formula (1) wherein: R 1 is any one of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and an alkenyl group having 2 to 10 carbon atoms; R 2 is any one of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, and an acyl group having 1 to 6 carbon atoms; and n represents an integer of 0 to 3.

4. The positive-type radiation-sensitive composition according to claim 3 , further comprising (C) a thermosensitive acid generator or a thermosensitive base generator.

5. The positive-type radiation-sensitive composition according to claim 4 , further comprising (D) a thermally crosslinkable compound.

6. The positive-type radiation-sensitive composition according to claim 5 which is used for forming a cured film.

7. A cured film formed from the positive-type radiation-sensitive composition according to claim 5 .

8. The cured film according to claim 7 , wherein the cured film is an interlayer insulating film of a display device.

9. A display device comprising the interlayer insulating film according to claim 8 .

10. The positive-type radiation-sensitive composition according to claim 1 , further comprising (C) a thermosensitive acid generator or a thermosensitive base generator.

11. The positive-type radiation-sensitive composition according to claim 10 , further comprising (D) a thermally crosslinkable compound.

12. A cured film formed from the positive-type radiation-sensitive composition according to claim 11 .

13. The cured film according to claim 12 , wherein the cured film is an interlayer insulating film of a display device.

14. A display device comprising the interlayer insulating film according to claim 13 .

15. The positive-type radiation-sensitive composition according to claim 2 , further comprising (C) a thermosensitive acid generator or a thermosensitive base generator.

16. The positive-type radiation-sensitive composition according to claim 15 , further comprising (D) a thermally crosslinkable compound.

17. A cured film formed from the positive-type radiation-sensitive composition according to claim 16 .

18. The cured film according to claim 17 , wherein the cured film is an interlayer insulating film of a display device.

19. A display device comprising the interlayer insulating film according to claim 18 .