IP Library Assignment 024772/0414
Patent Assignment
Reel/Frame 024772/0414

Assignment of Assignor's Interest

Recorded: 2010-08-02 Pages: 2
Assignors
YU, VINCENT
Executed: 2010-07-20
YEH, CHIH-YANG
Executed: 2010-04-28
HSIEH, HUNG CHANG
Executed: 2010-04-29
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. VI, HSINCHU SCIENCE PARK, HSINCHU, 300, TAIWAN
Covered Property (1)
Double Patterning Method Using Metallic Compound Mask Layer
Patent: 8,313,889 →
Application: 12/752,281 →
Publication: US 2010/0279234