Patent Assignment
Reel/Frame 024864/0840
Assignment of Assignor's Interest
Recorded: 2010-08-24
Received: 2010-08-24
Pages: 2
Assignor
LITONICS INTERNATIONAL IP LLC
Executed: 2010-07-19
Assignee
LG INNOTEK CO., LTD.
SEOUL SQUARE 20F, NAMDAEMUNNO 5-GA, JUNG-GU, SEOUL, KRX, 100-714, KOREA, REPUBLIC OF
Covered Properties
(3)
Photomask, Apparatus for Manufacturing Semiconductor Device Having the Photomask, and Method of Manufacturing Semiconductor Device Using the Photomask
Application:
12/394,296 →
Semiconductor Device with Stacked Semiconductor Chips of the Same Type
Application:
11/049,993 →
Methods for Cleaving Facets in Iii-V Nitrides Grown on C-Face Sapphire Substrates
Application:
09/682,181 →