Patent Assignment
Reel/Frame 024866/0169
Assignment of Assignor's Interest
Recorded: 2010-08-20
Pages: 5
Assignors
TORIUMI, SATOSHI
Executed: 2010-07-28
TAJIMA, RYOTA
Executed: 2010-07-28
OHTSUKI, TAKASHI
Executed: 2010-07-28
TANAKA, TETSUHIRO
Executed: 2010-07-28
TOKUMARU, RYO
Executed: 2010-07-28
ICHIJO, MITSUHIRO
Executed: 2010-07-29
KURIKI, KAZUTAKA
Executed: 2010-07-29
YOKOI, TOMOKAZU
Executed: 2010-07-29
ENDO, TOSHIYA
Executed: 2010-07-29
YAMAZAKI, SHUNPEI
Executed: 2010-07-27
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property
(1)
Method for Manufacturing Microcrystalline Semiconductor Film by Plasma Cvd Apparatus