Patent Assignment
Reel/Frame 025005/0054
Assignment of Assignor's Interest
Recorded: 2010-09-17
Pages: 3
Assignor
YAMAZAKI, SHUNPEI
Executed: 2010-09-13
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property
(1)
Plasma Cvd Apparatus, Method for Forming Microcrystalline Semiconductor Film and Method for Manufacturing Semiconductor Device