IP Library › Assignment 025185/0417
Patent Assignment
Reel/Frame 025185/0417

Assignment of Assignor's Interest

Recorded: 2010-10-22 Pages: 3
Assignors
LEE, JONG-CHEOL
Executed: 2010-10-11
PARK, KI-YEON
Executed: 2010-10-13
OH, SE-HOON
Executed: 2010-10-12
KIM, YOUN-SOO
Executed: 2010-10-13
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416, MAETAN-DONG, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property (1)
Methods of Forming a Metal Silicate Layer and Methods of Fabricating a Semiconductor Device Including the Metal Silicate Layer
Patent: 8,258,064 →
Application: 12/909,947 →
Publication: US 2011/0104907
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 9, 2010
From: MITCHELL, MARK BRYAN
To: SMITHKLINE BEECHAM CORPORATION
Reel/Frame 025483/0929 →