Patent Assignment
Reel/Frame 025329/0236
Assignment of Assignor's Interest
Recorded: 2010-11-08
Pages: 2
Assignee
HYNIX SEMICONDUCTOR INC.
SAN 136-1, AMI-RI, BUBAL-EUB, KYOUNGKI-DO, ICHEON-SI, KOREA, REPUBLIC OF
Covered Property
(1)
Method of Forming an Etching Mask Pattern from Developed Negative and Positive Photoresist Layers