IP Library › Assignment 025352/0473
Patent Assignment
Reel/Frame 025352/0473

Assignment of Assignor's Interest

Recorded: 2010-11-11 Pages: 11
Assignors
UEDA, HIROKAZU
Executed: 2010-10-27
TANAKA, YOSHINOBU
Executed: 2010-10-19
OHSAWA, YUSUKE
Executed: 2010-11-09
NOZAWA, TOSHIHISA
Executed: 2010-11-01
MATSUOKA, TAKAAKI
Executed: 2010-11-01
Assignee
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Film Forming Method of Silicon Oxide Film, Silicon Oxide Film, Semiconductor Device, and Manufacturing Method of Semiconductor Device
Patent: 8,486,792 →
Application: 12/992,209 →
Publication: US 2011/0074013