IP Library Assignment 025359/0308
Patent Assignment
Reel/Frame 025359/0308

Assignment of Assignor's Interest

Recorded: 2010-11-15 Pages: 2
Assignors
SUMIYA, MASAHIRO
Executed: 2010-08-03
TANAKA, MOTOHIRO
Executed: 2010-08-03
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,557,709 →
Application: 12/855,302 →
Publication: US 2011/0226734
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →