Merger

Recorded: 2010-12-07 Pages: 22

Assignor

RENESAS TECHNOLOGY CORP.

Executed: 2010-04-01

Assignee

RENESAS ELECTRONICS CORPORATION

1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI, KANAGAWA, JAPAN

Covered Properties (2)

Photomask and Pattern Forming Method Employing the Same

Patent: 5,429,896 →

Application: 08/162,319 →

Photomask and Pattern Forming Method Employing the Same

Patent: 7,115,344 →

Application: 10/777,060 →

Publication: US 2004/0161707

Related Assignments (2)

Other recorded transfers of the patents in this record — the chain of ownership.