IP Library Assignment 018552/0806
Patent Assignment
Reel/Frame 018552/0806

Assignment of Assignor's Interest

Recorded: 2006-11-21 Pages: 2
Assignor
HITACHI, LTD.
Executed: 2006-11-01
Assignee
RENESAS TECHNOLOGY CORP.
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Properties (8)
Photomask and Pattern Forming Method Employing the Same
Patent: 5,429,896 →
Application: 08/162,319 →
Photomask and Pattern Forming Method Employing the Same
Patent: 5,578,421 →
Application: 08/418,402 →
Photomask and Pattern Forming Method Employing the Same
Patent: 5,656,400 →
Application: 08/699,732 →
Photomask and Pattern Forming Method Employing the Same
Patent: 5,851,703 →
Application: 08/904,754 →
Photomask and Pattern Forming Method Employing the Same
Patent: 6,013,398 →
Application: 09/188,368 →
Photomask and Pattern Forming Method Employing the Same
Patent: 6,087,074 →
Application: 09/359,732 →
Photomask and pattern forming method employing the same
Patent: 6,258,513 →
Application: 09/577,367 →
Photomask and Pattern Forming Method Employing the Same
Patent: 6,383,718 →
Application: 09/893,532 →
Publication: US 2001/0036583
Related Assignments (3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 8, 1994
From: HASEGAWA, NORIO; MURAI, FUMIO; HAYANO, KATSUYA
To: HITACHI, LTD.
Reel/Frame 006886/0523 →
Merger Dec 7, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025641/0304 →
Merger Jan 21, 2011
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025699/0869 →