IP Library › Assignment 025644/0025
Patent Assignment
Reel/Frame 025644/0025

Assignment of Assignor's Interest

Recorded: 2011-01-14 Pages: 6
Assignors
DAVAL, NICOLAS
Executed: 2010-10-22
KONONCHUK, OLEG
Executed: 2011-01-12
GUIOT, ERIC
Executed: 2010-11-06
AULNETTE, CECILE
Executed: 2010-10-28
LALLEMENT, FABRICE
Executed: 2011-01-11
FIGUET, CHRISTOPHE
Executed: 2010-10-21
LANDRU, DIDIER
Executed: 2010-10-26
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
CHEMIN DES FRANQUES, PARC TECHNOLOGIQUE DES FONTAINES, BERNIN, 38190, FRANCE
Covered Property (1)
Process for Manufacturing a Structure Comprising a Germanium Layer on a Substrate
Application: 12/937,920 →
Publication: US 2011/0183493
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Feb 28, 2012
From: S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES; CHEMIN DES FRANQUES; PARC TECHNOLOGIES DES FONTAINES; BERNIN. FRANCE 38190
To: SOITEC
Reel/Frame 028138/0895 →