Patent Assignment
Reel/Frame 025715/0424
Assignment of Assignor's Interest
Recorded: 2011-01-27
Pages: 4
Assignors
WATANABE, TAKERU
Executed: 2010-12-02
KINSHO, TAKESHI
Executed: 2010-12-13
OGIHARA, TSUTOMU
Executed: 2010-12-03
TAKEMURA, KATSUYA
Executed: 2010-12-04
FUJII, TOSHIHIKO
Executed: 2010-12-03
KORI, DAISUKE
Executed: 2010-12-03
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Resist Underlayer Film Composition, Process for Forming Resist Underlayer Film, Patterning Process and Fullerene Derivative