IP Library › Assignment 025717/0004
Patent Assignment
Reel/Frame 025717/0004

Assignment of Assignor's Interest

Recorded: 2011-01-28 Pages: 3
Assignor
UEDA, SHINTARO
Executed: 2011-01-27
Assignee
ASM JAPAN K.K.
23-1, 6-CHOME, NAGAYAMA, TAMA-SHI, TOKYO, 206-0025, JAPAN
Covered Property (1)
Method of Depositing Film by Atomic Layer Deposition with Pulse-Time-Modulated Plasma
Patent: 8,465,811 →
Application: 13/016,735 →
Publication: US 2012/0196048