IP Library Assignment 025760/0001
Patent Assignment
Reel/Frame 025760/0001

Assignment of Assignor's Interest

Recorded: 2011-02-08 Pages: 5
Assignors
HAYASHI, DAISUKE
Executed: 2011-01-31
MURAKAMI, KOICHI
Executed: 2011-01-27
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Gas Shower Structure and Substrate Processing Apparatus
Patent: 9,550,194 →
Application: 13/020,104 →
Publication: US 2011/0186229