IP Library Assignment 025792/0875
Patent Assignment
Reel/Frame 025792/0875

Corrective Assignment to Correct the Spelling of the First Name of Assignor Olivier Ledoux Previously Recorded on Reel 025355 Frame 0683. Assignor(S) Hereby Confirms the Assignment of Assignor's Interest.

Recorded: 2011-02-15 Pages: 8
Assignors
DROUIN, ALEXIS
Executed: 2010-06-16
ASPAR, BERNARD
Executed: 2010-06-28
DESRUMAUX, CHRISTOPHE
Executed: 2010-08-30
LEDOUX, OLIVIER
Executed: 2010-09-13
FIGUET, CHRISTOPHE
Executed: 2010-06-14
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Property (1)
Method for Fabricating a Semiconductor Substrate
Patent: 8,575,010 →
Application: 12/918,935 →
Publication: US 2011/0024868
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 12, 2010
From: DROUIN, ALEXIS; ASPAR, BERNARD; DESRUMAUX, CHRISTOPHE; LEDOUX, OLIVER
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 025355/0683 →
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →