Patent Assignment
Reel/Frame 025833/0079
Assignment of Assignor's Interest
Recorded: 2011-02-18
Pages: 3
Assignee
ASM JAPAN K.K.
23-1, 6-CHOME, NAGAYAMA, TAMA-SHI, TOKYO, 206-0025, JAPAN
Covered Property
(1)
Method of Depositing Dielectric Film by Ald Using Precursor Containing Silicon, Hydrocarbon, and Halogen