IP Library › Assignment 025860/0027
Patent Assignment
Reel/Frame 025860/0027

Assignment of Assignor's Interest

Recorded: 2011-02-24 Pages: 2
Assignors
SAKURAI, HIDEAKI
Executed: 2011-02-18
TERAYAMA, MASATOSHI
Executed: 2011-02-18
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU,, TOKYO,, 105-8001, JAPAN
Covered Property (1)
Substrate Processing Method, Manufacturing Method of Euv Mask, and Euv Mask
Patent: 8,383,298 →
Application: 13/034,143 →
Publication: US 2011/0207031
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
Merger Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →