Patent Assignment
Reel/Frame 025893/0432
Assignment of Assignor's Interest
Recorded: 2011-03-03
Pages: 3
Assignors
OGAWA, TAKASHI
Executed: 2011-02-15
OBA, HIROSHI
Executed: 2011-02-15
ARAMAKI, FUMIO
Executed: 2011-02-15
YASAKA, ANTO
Executed: 2011-02-15
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Defect Repair Apparatus and Method for Euv Mask Using a Hydrogen Ion Beam
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.