Patent Assignment
Reel/Frame 025932/0663
Assignment of Assignor's Interest
Recorded: 2011-03-10
Pages: 4
Assignors
FUKUSHIMA, ATSUSHI
Executed: 2011-02-28
SHINDO, YUICHIRO
Executed: 2011-02-28
SHIMAMOTO, SUSUMU
Executed: 2011-02-28
Assignee
JX NIPPON MINING & METALS CORPORATION
6-3, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8164, JAPAN
Covered Property
(1)
High-Purity Copper or High-Purity Copper Alloy Sputtering Target, Process for Manufacturing the Sputtering Target, and High-Purity Copper or High-Purity Copper Alloy Sputtered Film
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.