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Patent Assignment
Reel/Frame 026099/0907

Assignment of Assignor's Interest

Recorded: 2011-04-07 Pages: 17
Assignors
HWANG, GUANG-YAW
Executed: 2011-03-29
LIN, CHUN-HSIEN
Executed: 2011-03-29
SHIH, HUNG-LING
Executed: 2011-03-29
LIAO, JIUNN-HSIUNG
Executed: 2011-03-29
LEE, ZHI-CHENG
Executed: 2011-03-29
HSU, SHAO-HUA
Executed: 2011-03-29
CHEN, YI-WEN
Executed: 2011-03-29
CHEN, CHENG-GUO
Executed: 2011-03-29
TSENG, JUNG-TSUNG
Executed: 2011-03-29
LIN, CHIEN-TING
Executed: 2011-03-29
HUANG, TONG-JYUN
Executed: 2011-03-29
YANG, JIE-NING
Executed: 2011-03-29
TSAI, TSUNG-LUNG
Executed: 2011-03-29
LIAO, PO-JUI
Executed: 2011-03-29
LAI, CHIEN-MING
Executed: 2011-03-29
CHEN, YING-TSUNG
Executed: 2011-03-29
MA, CHENG-YU
Executed: 2011-03-29
HUNG, WEN-HAN
Executed: 2011-03-29
HSU, CHE-HUA
Executed: 2011-03-29
Assignee
UNITED MICROELECTRONICS CORP.
NO.3, LI-HSIN ROAD 2, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU CITY, TAIWAN
Covered Property (1)
Oxygen treatment of replacement work-function metals in CMOS transistor gates
Patent: 9,384,962 →
Application: 13/082,387 →
Publication: US 2012/0256276