IP Library › Assignment 026206/0338
Patent Assignment
Reel/Frame 026206/0338

Assignment of Assignor's Interest

Recorded: 2011-05-02 Pages: 2
Assignors
KOBAYASHI, HIROYUKI
Executed: 2008-02-08
MAEDA, KENJI
Executed: 2008-02-08
YOKOGAWA, KENETSU
Executed: 2008-02-12
IZAWA, MASARU
Executed: 2008-02-12
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHINBASHI, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Method for Venting the Same to Atmosphere
Patent: 8,029,874 →
Application: 12/035,759 →
Publication: US 2009/0183683
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →