Patent Assignment
Reel/Frame 026207/0597
Assignment of Assignor's Interest
Recorded: 2011-05-02
Pages: 4
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, F-38190 BERNIN, FRANCE
Covered Property
(1)
Method of Manufacturing a Structure Comprising a Substrate and a Layer Deposited on One of Its Faces
Application:
12/672,797 →
Publication:
US 2011/0192343
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.