IP Library › Assignment 026257/0579
Patent Assignment
Reel/Frame 026257/0579

Assignment of Assignor's Interest

Recorded: 2011-05-11 Pages: 2
Assignor
YAMAZAKI, SHUNPEI
Executed: 2011-04-01
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property (1)
Manufacturing Method of Semiconductor Device Comprising Steps of Forming Oxide Semiconductor Film, Performing Heat Treatment on the Oxide Semiconductor Film, and Performing Oxygen Doping Treatment on the Oxide Semiconductor Film After the Heat Treatment
Patent: 8,828,811 →
Application: 13/091,181 →
Publication: US 2011/0260171