IP Library Assignment 026362/0960
Patent Assignment
Reel/Frame 026362/0960

Assignment of Assignor's Interest

Recorded: 2011-05-31 Pages: 3
Assignors
HASEBE, KAZUHIDE
Executed: 2011-05-02
MURAKAMI, HIROKI
Executed: 2011-05-02
KAKIMOTO, AKINOBU
Executed: 2011-05-02
Assignee
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Amorphous Silicon Film Formation Method and Amorphous Silicon Film Formation Apparatus
Patent: 9,006,021 →
Application: 13/094,043 →
Publication: US 2011/0263105