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Patent Assignment
Reel/Frame 026522/0709

Assignment of Assignor's Interest

Recorded: 2011-06-29 Pages: 2
Assignors
KOZAWA, MIWA
Executed: 2011-05-09
NOZAKI, KOJI
Executed: 2011-05-09
Assignee
FUJITSU LIMITED
1-1, KAMIKODANAKA 4-CHOME, NAKAHARA-KU,, KAWASAKI-SHI, KANAGAWA, 211-8588, JAPAN
Covered Property (1)
Pattern Forming Method, Method for Manufacturing Semiconductor Device, and Material for Forming Coating Layer of Resist Pattern
Patent: 8,906,598 →
Application: 13/168,472 →
Publication: US 2011/0250541