IP Library › Assignment 026551/0110
Patent Assignment
Reel/Frame 026551/0110

Assignment of Assignor's Interest

Recorded: 2011-07-06 Pages: 5
Assignors
VEYTIZOU, CHRISTELLE
Executed: 2011-01-31
GUIOT, ERIC
Executed: 2011-03-08
KONONCHUK, OLEG
Executed: 2011-03-08
LANDRU, DIDIER
Executed: 2011-01-31
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, F-38190 BERNIN, FRANCE
Covered Property (1)
Process for Locally Dissolving the Oxide Layer in a Semiconductor-on-Insulator Type Structure
Patent: 8,324,072 →
Application: 13/062,996 →
Publication: US 2012/0094496
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →