Patent Assignment
Reel/Frame 026597/0226
Assignment of Assignor's Interest
Recorded: 2011-07-14
Pages: 4
Assignors
WATANABE, TAKERU
Executed: 2011-06-17
FUJII, TOSHIHIKO
Executed: 2011-06-20
KINSHO, TAKESHI
Executed: 2011-06-20
OGIHARA, TSUTOMU
Executed: 2011-06-17
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME,, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Composition for Resist Underlayer Film, Process for Forming Resist Underlayer Film, Patterning Process, and Fullerene Derivative