IP Library › Assignment 026600/0178
Patent Assignment
Reel/Frame 026600/0178

Assignment of Assignor's Interest

Recorded: 2011-07-15 Pages: 2
Assignors
TSAI, CHUN HSIUNG
Executed: 2011-07-07
YU, XIONG-FEI
Executed: 2011-07-08
HUANG, YU-LIEN
Executed: 2011-07-08
LIN, DA-WEN
Executed: 2011-07-08
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. VI, HSINCHU SCIENCE PARK, HSINCHU, 300, TAIWAN
Covered Property (1)
Methods of Anneal After Deposition of Gate Layers
Patent: 8,809,175 →
Application: 13/183,909 →
Publication: US 2013/0017678