IP Library › Assignment 026611/0972
Patent Assignment
Reel/Frame 026611/0972

Assignment of Assignor's Interest

Recorded: 2011-07-19 Pages: 2
Assignors
MORIMOTO, MICHIKAZU
Executed: 2011-06-21
OHGOSHI, YASUO
Executed: 2011-06-21
OOHIRABARU, YUUZOU
Executed: 2011-06-21
ONO, TETSUO
Executed: 2011-06-21
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 9,305,803 →
Application: 13/185,598 →
Publication: US 2012/0252219
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →