IP Library Assignment 026755/0054
Patent Assignment
Reel/Frame 026755/0054

Assignment of Assignor's Interest

Recorded: 2011-08-16 Pages: 2
Assignors
INOUE, YOSHIHARU
Executed: 2011-07-25
MORIMOTO, MICHIKAZU
Executed: 2011-07-26
MATSUMOTO, TSUYOSHI
Executed: 2011-07-27
ONO, TETSUO
Executed: 2011-07-25
KANEKIYO, TADAMITSU
Executed: 2011-08-01
YAKUSHIJI, MAMORU
Executed: 2011-07-29
MIYAJI, MASAKAZU
Executed: 2011-07-26
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
21-14, NISHISHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 8,801,951 →
Application: 13/210,490 →
Publication: US 2013/0001197
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →