Patent Assignment
Reel/Frame 026777/0045
Assignment of Assignor's Interest
Recorded: 2011-08-19
Pages: 3
Assignors
SASAGAWA, SHINYA
Executed: 2011-08-10
FUJIKI, HIROSHI
Executed: 2011-08-10
FURUKAWA, SHINOBU
Executed: 2011-08-10
MIYAIRI, HIDEKAZU
Executed: 2011-08-10
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398, HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property
(1)
Etching Method Using Mixed Gas and Method for Manufacturing Semiconductor Device