IP Library › Assignment 026790/0956
Patent Assignment
Reel/Frame 026790/0956

Assignment of Assignor's Interest

Recorded: 2011-08-23 Pages: 2
Assignors
LIOU, JOUNG-WEI
Executed: 2011-08-03
YANG, HUI-CHUN
Executed: 2011-08-03
PENG, YU-YUN
Executed: 2011-08-03
LIN, KENG-CHU
Executed: 2011-08-03
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77 R.O.C., TAIWAN
Covered Property (1)
Low-K Dielectric Layer and Porogen
Patent: 9,054,110 →
Application: 13/204,507 →
Publication: US 2013/0032955