IP Library › Assignment 026820/0221
Patent Assignment
Reel/Frame 026820/0221

Assignment of Assignor's Interest

Recorded: 2011-08-29 Pages: 3
Assignors
TARUTANI, SHINJI
Executed: 2011-08-11
TSUBAKI, HIDEAKI
Executed: 2011-08-11
MIZUTANI, KAZUYOSHI
Executed: 2011-08-11
WADA, KENJI
Executed: 2011-08-11
HOSHINO, WATARU
Executed: 2011-08-11
Assignee
FUJIFILM CORPORATION
26-30, NISHIAZABU 2-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Pattern Forming Method, and Resist Composition, Developer and Rinsing Solution Used in the Pattern Forming Method
Patent: 8,603,733 →
Application: 13/196,530 →
Publication: US 2011/0305992