IP Library Assignment 027010/0808
Patent Assignment
Reel/Frame 027010/0808

Assignment of Assignor's Interest

Recorded: 2011-10-04 Pages: 10
Assignors
NOZAWA, TOSHIHISA
Executed: 2011-09-19
SASAKI, MASARU
Executed: 2011-09-19
HASHIMOTO, JUN
Executed: 2011-09-19
YOSHIMURA, SHOTA
Executed: 2011-09-19
OZU, TOSHIHISA
Executed: 2011-09-19
NISHIZUKA, TETSUYA
Executed: 2011-09-21
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Plasma Etching Apparatus, Plasma Etching Method, and Semiconductor Device Manufacturing Method
Patent: 8,969,210 →
Application: 13/232,160 →
Publication: US 2012/0064726