IP Library Assignment 027052/0511
Patent Assignment
Reel/Frame 027052/0511

Assignment of Assignor's Interest

Recorded: 2011-10-13 Pages: 3
Assignors
HAYAMA, TAKAHIRO
Executed: 2011-09-08
KUSABIRAKI, KAZUNORI
Executed: 2011-09-08
NISHIMURA, YUKIO
Executed: 2011-09-09
MARUYAMA, KEN
Executed: 2011-10-04
TANAKA, KIYOSHI
Executed: 2011-09-08
Assignee
JSR CORPORATION
1-9-2, HIGASHI-SHINBASHI, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property (1)
Liquid Immersion Lithography Upper-Layer Film-Forming Composition and Photoresist Pattern-Forming Method
Patent: 9,261,789 →
Application: 13/110,855 →
Publication: US 2012/0021359
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →