IP Library › Assignment 027206/0986
Patent Assignment
Reel/Frame 027206/0986

Assignment of Assignor's Interest

Recorded: 2011-11-10 Pages: 6
Assignors
WIELAND, MARCO JAN-JACO, MR.
Executed: 2010-08-30
VAN DE PEUT, TEUNIS, MR.
Executed: 2010-08-12
Assignee
MAPPER LITHOGRAPHY IP B.V.
COMPUTERLAAN 15, DELFT, 2628 XK, NETHERLANDS
Covered Property (1)
Method of Generating a Two-Level Pattern for Lithographic Processing and Pattern Generator Using the Same
Patent: 8,598,544 →
Application: 13/293,370 →
Publication: US 2012/0286169
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Court Appointment May 7, 2019
From: MAPPER LITHOGRAPHY HOLDING B.V.; MAPPER LITHOGRAPHY IP B.V.; MAPPER LITHOGRAPHY B.V.
To: WITTEKAMP, J.J.
Reel/Frame 049104/0734 →
Assignment of Assignor's Interest May 7, 2019
From: WITTEKAMP, J.J.
To: ASML NETHERLANDS B.V.
Reel/Frame 049296/0606 →