IP Library › Assignment 027274/0201
Patent Assignment
Reel/Frame 027274/0201

Assignment of Assignor's Interest

Recorded: 2011-11-23 Pages: 2
Assignors
IZAWA, MASARU
Executed: 2011-10-03
YAMAMOTO, KOUICHI
Executed: 2011-10-04
NAKATA, KENJI
Executed: 2011-10-04
ITOU, ATSUSHI
Executed: 2011-10-04
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,632,688 →
Application: 13/236,800 →
Publication: US 2013/0045547
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →