Patent Assignment
Reel/Frame 027301/0400
A Modifying Conversion
Recorded: 2011-11-30
Pages: 6
Assignor
CARL ZEISS SMT AG
Executed: 2010-10-14
Assignee
CARL ZEISS SMT GMBH
RUDOLF-EBER-STRASSE 2, OBERKOCHEN, 73447, GERMANY
Covered Properties
(2)
Microlithographic Exposure Method as Well as a Projection Exposure System for Carrying Out the Method
Method of Measuring a Deviation of an Optical Surface from a Target Shape