IP Library Assignment 027322/0265
Patent Assignment
Reel/Frame 027322/0265

Assignment of Assignor's Interest

Recorded: 2011-12-05 Pages: 3
Assignors
NAKAHARA, KAZUO
Executed: 2011-11-04
NAGAI, TOMOKI
Executed: 2011-11-02
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 1058640, JAPAN
Covered Property (1)
Resist Lower Layer Film-Forming Composition, Polymer, Resist Lower Layer Film, Pattern-Forming Method, and Method of Producing Semiconductor Device
Patent: 8,647,810 →
Application: 13/248,198 →
Publication: US 2012/0077124
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →