IP Library › Assignment 027330/0855
Patent Assignment
Reel/Frame 027330/0855

Assignment of Assignor's Interest

Recorded: 2011-12-06 Pages: 13
Assignor
PICOGIGA INTERNATIONAL
Executed: 2006-03-30
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Property (1)
Method for Manufacturing a Layer of Gallium Nitride or Gallium and Aluminum Nitride
Patent: 8,093,077 →
Application: 12/934,359 →
Publication: US 2011/0012128
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 6, 2011
From: PICOGIGA
To: PICOGIGA INTERNATIONAL
Reel/Frame 027330/0885 →
Assignment of Assignor's Interest Dec 6, 2011
From: LAHRECHE, HACENE
To: PICOGIGA
Reel/Frame 027330/0935 →
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →
Change of Name Aug 12, 2014
From: PICOGIGA INTERNATIONAL
To: SOITEC SPECIALTY ELECTRONICS
Reel/Frame 033520/0702 →
Assignment of Assignor's Interest Aug 14, 2014
From: SOITEC SPECIALTY ELECTRONICS
To: SOITEC
Reel/Frame 033538/0104 →