IP Library Assignment 027580/0488
Patent Assignment
Reel/Frame 027580/0488

Assignment of Assignor's Interest

Recorded: 2012-01-24 Pages: 2
Assignors
KAGOSHIMA, AKIRA
Executed: 2011-12-12
SHIRAISHI, DAISUKE
Executed: 2011-12-12
NAGATANI, YUJI
Executed: 2011-12-12
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME,, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,828,184 →
Application: 13/356,676 →
Publication: US 2013/0119016
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →