IP Library › Assignment 027629/0964
Patent Assignment
Reel/Frame 027629/0964

Assignment of Assignor's Interest

Recorded: 2012-02-01 Pages: 2
Assignors
INOUE, YOSHIHARU
Executed: 2012-01-13
ONO, TETSUO
Executed: 2012-01-13
MORIMOTO, MICHIKAZU
Executed: 2012-01-13
FUJII, MASAKI
Executed: 2012-01-13
MIYAJI, MASAKAZU
Executed: 2012-01-13
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME,, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 8,828,254 →
Application: 13/363,415 →
Publication: US 2013/0029492
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →