IP Library › Assignment 027631/0054
Patent Assignment
Reel/Frame 027631/0054

Assignment of Assignor's Interest

Recorded: 2012-02-01 Pages: 2
Assignors
WATANABE, TOMOYUKI
Executed: 2011-12-14
YAKUSHIJI, MAMORU
Executed: 2011-12-14
MORIMOTO, MICHIKAZU
Executed: 2011-12-14
ONO, TETSUO
Executed: 2011-12-15
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME,, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Etching Method
Patent: 8,580,131 →
Application: 13/363,488 →
Publication: US 2013/0109184
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →