IP Library Assignment 027722/0387
Patent Assignment
Reel/Frame 027722/0387

Assignment of Assignor's Interest

Recorded: 2012-02-17 Pages: 2
Assignors
ABE, TAKAHIRO
Executed: 2012-01-24
SHIMADA, TAKESHI
Executed: 2012-01-24
YOSHIDA, ATSUSHI
Executed: 2012-01-24
YAMADA, KENTARO
Executed: 2012-01-24
FUJITA, DAISUKE
Executed: 2012-01-24
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME,, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 8,591,752 →
Application: 13/399,030 →
Publication: US 2013/0146563
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →